Creating Nano etching equipment high speed and uniformity
economic daily
September 4, 2024
Author Economic Daily Zhang Jie
September 4, 2024
Author Economic Daily Zhang Jie
Creating Nano Technology, a major domestic manufacturer of normal pressure and low voltage plasma equipment, is committed to the development of atmospheric plasma, anti-fouling, anti-bacterial, anti-fingerprint coating technology and continuous winding transmission based on its superior plasma development capabilities and coating technology. process (roll to roll, RTR), and has made achievements in the development of new processes such as GOG, PEDOT, EMI coating, OLED, and micro LED.
Low-voltage plasma cleaning equipment (In-line Plasma Cleaning Equipment) launched by Creating Nano. Creating Nano／Provided
With the advent of the Internet of Things and the AI generation, the demand for heterogeneous integration of chips has gradually emerged, which has also led to the development of advanced packaging and other technical needs. Creating Nano Technology has built on the existing low-pressure reactive ion etching (RIE) equipment. , combined with patented electrode design, gas flow field uniformization configuration, and fluid cooling system of the substrate stage, it achieves the characteristics of high etching rate, high uniformity and low process temperature, as well as high aspect ratio and anisotropic etching. According to the process requirements, it is suitable for use in semiconductor, packaging, optoelectronics and other related fields to perform processes such as dry etching (Etching) or ashing (Ashing).
Another continuous low-voltage plasma cleaning equipment (In-line Plasma Cleaning Equipment) is characterized by fully automated production, reducing manual picking and placing movements, thereby reducing the risk of product contamination. Paired with the patented water-cooled electrode and gas flow field design, the cleaning effect and uniformity of the product can be improved. Therefore, it is widely used in semiconductor, packaging, optoelectronics and other related fields for cleaning, activation, modification or roughening processes, such as Chip, Surface cleaning and modification of die, lead frame, etc., or cleaning treatment before underfill, wire bonding, and molding, etc.
Among them, the continuous (in-line) plasma cleaning equipment produced by the company is widely used in IC packaging, such as surface cleaning before die bonding, wire bonding or sealing. The equipment has the characteristics of fast speed and high uniformity. With its adjustable multi-track design and automatic material distribution system, it can provide cleaning efficiency and reliability, while also making production planning more flexible.
Because Creating Nanotechnology has common technology research and development capabilities with the industry, it has great development capabilities in both touch panels and soft and hard board manufacturing processes. It has been laying out nanomaterials for many years and is constantly looking for them in various industries including panels and semiconductor industries. Outlets and development application areas.
Creating Nano Technology Tel: (06) 232-3927.
Related links: https://money.udn.com/money/story/5735/8204309
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Creating Nano Technologies, Inc.
59 Alley 21 Lane 279, Chung Cheng Road, Yung Kang City, Tainan, TAIWAN
TEL:886-6-2323927 FAX:886-6-2013306 URL: http://www.creating-nanotech.com